Fundamentals of Electrochemical Deposition

Fundamentals of Electrochemical Deposition

Paunovic, Milan; Schlesinger, Mordechay

John Wiley & Sons Inc

08/2006

392

Dura

Inglês

9780471712213

15 a 20 dias

678

Descrição não disponível.
Preface to the Second Edition. Preface to the First Edition.

1. Overview.

2. Water and Ionic Solutions.

3. Metals and Metal Sufaces.

4. Metal-Solution Interphase.

5. Equilibrium Electrode Potential.

6. Kinetics and Mechanism of Electrodeposition.

7. Nucleation and Growth Models.

8. Electroless Deposition.

9. Displacement Deposition.

10. Effect of Additives.

11. Electrodeposition of Alloys.

12. Metal Deposit and Current Distribution.

13. Characterization of metallic Surfaces and Thin Films.

14. In Situ Characterization of Deposition.

15. Mathematical Modeling in Electrochemistry.

16. Structure anad Properties of Deposits.

17. Electrodeposited Multilayers.

18. Interdiffusion in Thin Films.

19. Applications in Semiconductors Technology.

20. Applications in the Fields of Magnetism and Microelectronics.

21. Frontiers in Applications: Applications in the Field of Medicine.

Index.
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