Fundamentals of Electrochemical Deposition
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Fundamentals of Electrochemical Deposition
Paunovic, Milan; Schlesinger, Mordechay
John Wiley & Sons Inc
08/2006
392
Dura
Inglês
9780471712213
15 a 20 dias
678
Descrição não disponível.
Preface to the Second Edition. Preface to the First Edition.
1. Overview.
2. Water and Ionic Solutions.
3. Metals and Metal Sufaces.
4. Metal-Solution Interphase.
5. Equilibrium Electrode Potential.
6. Kinetics and Mechanism of Electrodeposition.
7. Nucleation and Growth Models.
8. Electroless Deposition.
9. Displacement Deposition.
10. Effect of Additives.
11. Electrodeposition of Alloys.
12. Metal Deposit and Current Distribution.
13. Characterization of metallic Surfaces and Thin Films.
14. In Situ Characterization of Deposition.
15. Mathematical Modeling in Electrochemistry.
16. Structure anad Properties of Deposits.
17. Electrodeposited Multilayers.
18. Interdiffusion in Thin Films.
19. Applications in Semiconductors Technology.
20. Applications in the Fields of Magnetism and Microelectronics.
21. Frontiers in Applications: Applications in the Field of Medicine.
Index.
1. Overview.
2. Water and Ionic Solutions.
3. Metals and Metal Sufaces.
4. Metal-Solution Interphase.
5. Equilibrium Electrode Potential.
6. Kinetics and Mechanism of Electrodeposition.
7. Nucleation and Growth Models.
8. Electroless Deposition.
9. Displacement Deposition.
10. Effect of Additives.
11. Electrodeposition of Alloys.
12. Metal Deposit and Current Distribution.
13. Characterization of metallic Surfaces and Thin Films.
14. In Situ Characterization of Deposition.
15. Mathematical Modeling in Electrochemistry.
16. Structure anad Properties of Deposits.
17. Electrodeposited Multilayers.
18. Interdiffusion in Thin Films.
19. Applications in Semiconductors Technology.
20. Applications in the Fields of Magnetism and Microelectronics.
21. Frontiers in Applications: Applications in the Field of Medicine.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
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Preface to the Second Edition. Preface to the First Edition.
1. Overview.
2. Water and Ionic Solutions.
3. Metals and Metal Sufaces.
4. Metal-Solution Interphase.
5. Equilibrium Electrode Potential.
6. Kinetics and Mechanism of Electrodeposition.
7. Nucleation and Growth Models.
8. Electroless Deposition.
9. Displacement Deposition.
10. Effect of Additives.
11. Electrodeposition of Alloys.
12. Metal Deposit and Current Distribution.
13. Characterization of metallic Surfaces and Thin Films.
14. In Situ Characterization of Deposition.
15. Mathematical Modeling in Electrochemistry.
16. Structure anad Properties of Deposits.
17. Electrodeposited Multilayers.
18. Interdiffusion in Thin Films.
19. Applications in Semiconductors Technology.
20. Applications in the Fields of Magnetism and Microelectronics.
21. Frontiers in Applications: Applications in the Field of Medicine.
Index.
1. Overview.
2. Water and Ionic Solutions.
3. Metals and Metal Sufaces.
4. Metal-Solution Interphase.
5. Equilibrium Electrode Potential.
6. Kinetics and Mechanism of Electrodeposition.
7. Nucleation and Growth Models.
8. Electroless Deposition.
9. Displacement Deposition.
10. Effect of Additives.
11. Electrodeposition of Alloys.
12. Metal Deposit and Current Distribution.
13. Characterization of metallic Surfaces and Thin Films.
14. In Situ Characterization of Deposition.
15. Mathematical Modeling in Electrochemistry.
16. Structure anad Properties of Deposits.
17. Electrodeposited Multilayers.
18. Interdiffusion in Thin Films.
19. Applications in Semiconductors Technology.
20. Applications in the Fields of Magnetism and Microelectronics.
21. Frontiers in Applications: Applications in the Field of Medicine.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.