Handbook of Plasma Immersion Ion Implantation and Deposition
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Handbook of Plasma Immersion Ion Implantation and Deposition
Anders, Andre
John Wiley & Sons Inc
10/2000
760
Dura
Inglês
9780471246985
15 a 20 dias
1310
Descrição não disponível.
Introduction (J. Conrad).
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
plasmas; plasma immersion ion; survey; methodsa brief; design; plasma; safety; nonsemiconductor applications; semiconductor applications; techniques; book; workpiece; sheath; kinetic energy; gain; ions; between; surface; energy; subsurface
Introduction (J. Conrad).
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
Este título pertence ao(s) assunto(s) indicados(s). Para ver outros títulos clique no assunto desejado.
